The Anritsu MP2110A BERTWave is an integrated optical test platform combining up to 4-channel Bit Error Rate Tester (BERT) and up to 4-channel sampling oscilloscope in a single instrument. Designed for efficient evaluation and production inspection of optical modules from 10G to 1.6T, it eliminates the need for separate test equipment, reducing capital expenditure and measurement time in high-volume manufacturing environments. The system features an integrated PC for measurement processing and supports simultaneous transmitter/receiver characterization of optical modules.
## Technical Specifications
**BERT Performance**
• Operating frequency: 24.3 Gbit/s to 28.2 Gbit/s (standard); 9.5 Gbit/s to 14.2 Gbit/s (optional)
• PPG jitter: 600 fs rms (typical)
• Error detector sensitivity: 25 mV (typical)
**Sampling Oscilloscope Performance**
• Electrical bandwidth: 40 GHz
• Optical bandwidth (SMF): 35 GHz (typical)
• Optical bandwidth (MMF): 25 GHz (typical)
• Sampling speed: Up to 250,000 samples per second (two channels simultaneous)
• Optical sensitivity (SMF): -15 dBm (typical)
• Optical noise (SMF): 3.4 µW (typical)
• Intrinsic jitter: 200 fs rms (typical, with high-accuracy trigger option)
• Eye diagram capture: 1 million samples of 25 Gbaud signals in approximately 5 seconds
**Signal Analysis**
• NRZ/PAM4 analysis with TDECQ support
• PAM4 signal analysis up to 53-Gbaud
• Built-in clock recovery unit (CRU) for NRZ and PAM4: 26/53 Gbaud
• NRZ jitter component analysis
• Automated mask margin testing
## Key Features
• Dual-function architecture reduces test setup complexity and footprint
• High sampling rate delivers eye diagram analysis 65% faster than conventional instruments
• 25 mV error detector sensitivity enables BER measurements on attenuated signals
• Internal PC eliminates external controller dependency
• Supports 100 GbE, OTU4, and proprietary optical standards
## Typical Applications
• Optical module R&D characterization
• Production acceptance testing
• Transmitter and receiver performance validation
• Eye pattern and mask margin compliance verification
