The EXFO OWA-9500 Optical Waveguide Analyzer characterizes optical waveguides using refracted near-field (RNF) measurement technique. It delivers submicron spatial resolution refractive index profile (RIP) data across glass-based, fused silica, SiON, and polymer waveguide materials. The instrument enables process control and yield optimization during R&D and production phases of integrated photonic devices.
## Technical Specifications
• **Measurement Technique:** Refracted Near-Field (RNF)
• **Spatial Resolution:** Submicron
• **Scan Resolution:** 0.1 µm (x-y directions)
• **Probe Wavelength:** 655 nm
• **Waveguide Endface Polishing Tolerance:** <0.5°
• **Supported Materials:** Glass-based, fused silica (SiO₂/SiO₂-Si), SiON (n = 1.45–1.60), polymer-based
## Key Features
• High-numerical-aperture immersion objective lens focuses collimated laser beam onto waveguide endface
• Z-direction positioning for precise endface alignment
• Silicon detector captures refracted beam; signal magnitude correlates inversely with refractive index variance
• Raster scanning generates 3D RIP maps with contour analysis and multi-level slicing capability
• Converter software exports topographic data to simulation platforms (OptiBPM)
• Beam Propagation Method (BPM) simulation integration for electro-optic behavior analysis
## Typical Applications
• NxN star couplers
• Arrayed-waveguide gratings (AWGs)
• Optical add-drop multiplexers
• NxN matrix switches
• Silicon photonics device characterization
• Planar lightwave circuit (PLC) development and qualification
## Compatibility & Integration
Measured RIP data integrates directly with OptiBPM and equivalent BPM simulation tools, enabling predictive modeling of device performance before production release.
