The Lambda/TDK EMI GEN40-375 is a 15 kW programmable DC power supply engineered for industrial test, process control, and automated equipment applications. This 3U rack-mount/benchtop unit delivers 0–40 VDC at up to 375 ADC with exceptional output stability: 0.02 Vrms voltage ripple and 0.2 Arms current ripple across 5 Hz–1 MHz. Line and load regulation remain tight in both constant-voltage and constant-current modes, with recovery to within 0.5% of rated output following 10–90% load transients.
## Technical Specifications
• **Output Power:** 15 kW
• **Voltage Range:** 0–40 VDC (rated 40 VDC)
• **Current Range:** 0–375 ADC (rated 375 ADC)
• **Voltage Ripple & Noise:** 0.02 Vrms (5 Hz–1 MHz)
• **Current Ripple & Noise:** 0.2 Arms (5 Hz–1 MHz)
• **Efficiency:** 88% typical
• **Line Regulation (CV/CC):** 0.01% Vo + 2 mV / 0.01% Io + 2 mA
• **Load Regulation (CV/CC):** 0.05% Vo + 5 mV / 0.1% Io + 5 mA
• **Load Transient Recovery:** Within 0.5% for 10–90% step change
• **Warm-up Drift:** 0.01% Vo + 5 mV after 30 minutes
• **Input (3-Phase AC):** 208 VAC (180–253) or 480 VAC (432–528), 47–63 Hz
• **Power Factor:** 0.88 (Passive PFC)
## Key Features
• Dual continuous encoders for coarse/fine voltage and current adjustment
• Over-voltage protection (OVP) and under-voltage lockout (UVL) with front-panel control
• Remote enable/disable and output shutoff
• Front-panel lock/unlock and mode selection (auto/safe restart)
• Output current foldback protection
• Advanced parallel operation supports up to four units with aggregated current/power
• Local/remote output voltage sense for precision load regulation
## Interfaces & Integration
• **Standard:** RS-232, RS-485
• **Optional:** LAN (LXI-compliant), USB 2.0, IEEE 488.2 SCPI, isolated 0–5V/0–10V analog program, 4–20 mA isolated current control
• **Rear Connectors:** DB25 analog I/O, RS-485 daisy-chain to other Genesys™ units
• **DIP Switch Configuration:** Programmable function and address selection
## Typical Applications
Automated test equipment, component burn-in, electroplating and anodizing, materials processing, and multi-unit parallel power systems.
