The Millipore/Tylan FC260 4V is a precision mass flow controller engineered for accurate gas flow measurement and control in semiconductor processing, chemical research, and industrial gas mixing. This instrument delivers reliable performance across demanding applications without requiring pressure or temperature corrections, making it ideal for process-critical environments.
Technical Specifications
• Flow Range: Up to 200 standard liters per minute (SLPM); specific units calibrated for 3 SLPM, 600 SCCM, and 300 SCCM
• Accuracy: ±1.0% (factory calibrated for specific flow range and gas)
• Repeatability: ±0.2%
• Linearity: ±0.5%
• Turndown Ratio: 50:1
• Supply Voltage: +12 VDC to +18 VDC
• Output Signal: 0 to 5 VDC
• Pressure Independence: No corrections required
• Temperature Independence: No corrections required
• Valve Through-Leak: <2% full scale (N.C. and N.O., 10 SCCM to 9.99 SLM); <5% full scale (N.O., 10 to 30 SLM)
– Key Features
• Attitude insensitive flow sensor ensures consistent performance regardless of mounting orientation
• Superior bypass design provides precise flow control
• Solid state valve assembly delivers reliable valve operation
• Laminar flow design maintains consistent flow characteristics
• Autozero digital circuitry automatically resets outputs to zero under no-flow conditions and compensates for temperature coefficients and calibration drift
• User-selectable response time accommodates various process durations
• Balanced power load minimizes signal differences
• Insensitive to power supply variations within specified voltage ranges
– Gas Compatibility
Designed for precise control of various gases including N₂ and SiH₄.
– Typical Applications
• Semiconductor process control
• Chemical research and laboratory gas systems
• Industrial gas mixing and blending operations
• Equipment requiring elastomer-sealed, precision flow control
– Compatibility & Integration
Part of the FC260/FM360 series, utilizing proven components with innovative mechanical and electrical design optimized for semiconductor process requirements.
