The Porvair Filtration TEM-811-6 is a high-purity in-line filter engineered for critical semiconductor, process gas, and clean-dry air applications. It delivers 3 nm (0.003 micron) particle retention through a PTFE membrane supported by polypropylene, housed in electropolished 316L stainless steel. The unit is 100% helium leak tested to better than 1×10⁻⁹ atm cc/second and manufactured in a cleanroom environment with filtered nitrogen purge, ensuring out-of-package cleanliness essential for metrology, inspection, and lithography systems.
Technical Specifications
• Filtration Rating: 3 nm (0.003 micron) particle retention
• Housing Material: 316L stainless steel, electropolished to 15Ra or 10Ra surface finish
• Internal Media: PTFE membrane with polypropylene support
• Seal Material: Viton O-rings (standard)
• Connection Type: 3/8″ compression inlet/outlet
• Overall Length: 86.9 mm (3.42 inches)
• Maximum Operating Temperature: 80°C (176°F)
• Maximum Operating Pressure: 51.7 bar (750 psig) at 20°C (68°F)
• Maximum Forward Flow Differential Pressure: 6.0 bar (87 psi) at 20°C; 4.0 bar (58 psi) at 80°C
• Helium Leak Test: 100% tested to greater than 1×10⁻⁹ atm cc/second
– Key Features
• Electropolished 316L housing resists corrosion in etching and CVD processing gases
• PTFE membrane provides superior chemical resistance across wide solvent ranges
• Viton O-ring seals compatible with aggressive process chemistries
• Cleanroom manufacturing and filtered nitrogen final purge eliminate organic contamination
• Compression fittings enable rapid, leak-free installation
– Typical Applications
• Semiconductor gas filtration systems
• Process inert facility gases
• Clean-dry air for critical metrology and lithography tools
– Compatibility & Integration
The TEM-811-6 integrates into standard 3/8″ compression line installations. Filter replacement is recommended at 6-month intervals when operating above 69°C (156°F), or annually for elevated CDA temperatures between 50–69°C (122–156°F).
