The MKS Instruments 1179A Mass-Flo® 1179A11CR1BV-SPCAL is a general-purpose mass flow controller with elastomer seals, engineered for precise measurement and control of gas mass flow rates across semiconductor processing, analytical instrumentation, and chemical reaction monitoring applications. This normally-closed device operates across full-scale ranges from 10 sccm to 20 slm and delivers ±1.0% of full-scale accuracy in analog configurations, with exceptional zero stability and minimal span drift.
Technical Specifications
• Flow Range: 10 sccm to 20 slm (model-dependent); 1179A11CR1BV-SPCAL available in 10, 20, 50, 100, 200, 500, 1000, 2000, 5000, 10000, 20000, 30000 sccm configurations
• Control Range: 0.2 sccm to 100% of full scale
• Accuracy (Analog): ±1.0% of full scale (including non-linearity, hysteresis, non-repeatability; referenced to 760 mmHg, 0°C)
• Accuracy (Digital): Percent of reading
• Repeatability: ±0.2% of full scale
• Resolution: 0.1% of full scale
• Zero Temperature Coefficient: <0.05% of full scale/°C
• Span Temperature Coefficient: <0.08% of reading/°C
• Warm-up Time: <2 minutes to 0.2% of full scale steady-state
• Settling Time: <2 seconds (SEMI E17-91)
• Response Time: <1 second
• Footprint: Standard 3-inch (direct replacement compatible)
• Valve State: Normally closed
– Key Features
• Wetted materials: 316L stainless steel with Viton®, neoprene, Buna-N, Kalrez, or all-metal seal options
• 316L stainless steel surface finish: <32 µin Ra maximum
• Output signals: 0–5 VDC, 0–10 V, 4–20 mA, RS-485, or DeviceNet™
• Set point command: 0–5 VDC input from <20 kΩ source impedance
• Dual functionality: Operates as pressure controller when connected to suitable transducer
– Typical Applications
• Semiconductor processing and fabrication
• Analytical instrumentation
• Chemical reaction monitoring and process control
– Compatibility & Integration
Standard 3-inch footprint enables direct retrofit installation without gas line modifications. Digital and analog output architectures support integration into distributed control systems and legacy instrumentation platforms.
