The MKS Instruments 640A23TW1M22K-S is an absolute pressure controller engineered for precision regulation in semiconductor manufacturing, vacuum systems, and demanding process applications. Built on Baratron® capacitance manometer technology, it delivers measurement accuracy of ±0.5% of Reading and control accuracy of ±0.2% of Full Scale. The closed-loop system integrates a pressure transducer, proportioning control valve, and advanced control electronics to maintain setpoint pressures across full-scale ranges of 10, 100, or 1000 Torr, or 60 and 100 psi. Control spans from greater than 2% to 100% of Full Scale with response times typically under 1.0 second.
Technical Specifications
• Measurement Accuracy: ±0.5% of Reading (linearity, hysteresis, repeatability combined)
• Control Accuracy: ±0.2% of Full Scale
• Control Range: >2% to 100% of Full Scale
• Zero Temperature Coefficient: ±0.02% of Full Scale/°C
• Span Temperature Coefficient: ±0.04% of Reading/°C
• Transducer Over Pressure Limit: 45 psia or 2× Full Scale, whichever is greater
• Meter Response Time: <100 msec
• Pressure Resolution: <100 msec
• Response Time (Typical): <1.0 sec (excluding system time constant)
• External Leak Integrity: <10⁻⁹ scc/sec He
• Operating Temperature: 0°C to 50°C
• Storage Temperature: -20°C to 80°C
• Transducer Over Pressure Limit: 45 psia or 2× Full Scale (whichever is greater)
– Key Features
• Baratron® capacitance manometer technology ensures high accuracy and repeatability
• Normally closed valve with metal seat material
• Wetted materials: 316L S.S., 316L/VAR S.S., Inconel, Nickel
• Maximum differential pressure: 150 psi (50–10,000 sccm orifices); 30 psi (20,000–50,000 sccm orifices)
• Downstream control standard; upstream control optional
• Metal valve leak integrity: <1% of Full Scale (N₂ @ 1 atm)
– Electrical Specifications
• Power Required: ±15 VDC ±5%, 200 mA maximum
• Input Control Signals: Linear 0–5 VDC or 0–10 VDC, user-selectable
• Output Signals: Linear 0–5 VDC = 0–100% of Full Scale
– Typical Applications
Semiconductor manufacturing, vacuum system regulation, precision gas flow control in research and production environments.
