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Nanometrics Nanospec AFT 4150

SKU: AFT 4150Categories: Metrology Equipment
30 Days Warranty30 Days Free Returns >

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The Nanometrics Nanospec AFT 4150 is a thin film metrology system used for measuring film thickness and refractive index. It is widely used in semiconductor and materials science applications.

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Equipment info

The Nanometrics Nanospec AFT 4150 is an automated film thickness measurement system for semiconductor and materials science metrology. It employs visible-light reflectometry to measure film thickness and refractive index non-destructively by analyzing interference effects against a bare silicon reference. The instrument accommodates 3-inch to 6-inch diameter wafers and measures films from 100 Å to 50 µm in a single pass.

Technical Specifications

Measurement Principle: Reflectometry using visible light and optical interference.

Film Thickness Range: 100 Å to 50 µm.

Wafer Compatibility: 3-inch to 6-inch diameter wafers.

Refractive Index Measurement: Manual or automatic determination supported.

Multi-layer Capability: Simultaneous measurement of underlayer and outer film thickness via dedicated programs (4, 5, 6, 11, 253).

Wavelengths: Visible spectrum operation with selectable/adjustable wavelengths. Filters available for wavelengths below 460 nm.

Objective Lenses: Multiple lens options; critical focus procedures for films below 200 Å may require higher magnification objectives.

Gain Control: Adjustable photo intensity meter gain optimization.

Light Source: Halogen lamp with documented replacement procedures.

– Key Features

• Measures oxide on silicon, nitride on silicon, polysilicon on oxide, resist layers, and multi-layer stacks
• Precise focusing capability for ultra-thin films
• Adjustable optical gain for signal optimization
• Printer output support for results documentation
• Menu-driven character-based interface via integrated computer system
• Modular optical head design (7200-18 visible film thickness head)

– Typical Applications

Semiconductor process control, oxide/nitride layer characterization, resist metrology, and polysilicon film analysis across wafer fab and materials research environments.

– Compatibility & Integration

Standard AC power operation. Keyboard-driven control with printer output capability. Proprietary firmware supports measurement of stacked dielectric and conductive films on various substrates.

MPN

AFT 4150

Wavelength Range

Visible spectrum; selectable wavelengths with filters available below 460 nm

Brand Name

Nanometrics

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