The Stanford Research Systems PPR300 is an in-line vacuum process monitoring system built around a Residual Gas Analyzer (RGA) for real-time gas composition diagnostics. It provides dual analysis paths—a high conductivity route for base vacuum measurement and a pressure-reducing path with micro-hole orifice sampling for process monitoring at operating pressures of 0.01, 0.1, 1.0, or 10 Torr. The system reduces sample pressure to the RGA operating point of approximately 10⁻⁶ Torr using a hybrid turbomolecular pump and diaphragm pump assembly.
Technical Specifications
• Mass range: 100, 200, or 300 amu
• Dynamic range: 6 orders of magnitude (120 dB in select configurations)
• Response time: 2 seconds at 0.1 Torr inlet pressure
• Sample pressure reduction: To approximately 10⁻⁶ Torr
• Selectable inlet pressures: 0.01, 0.1, 1.0, or 10 Torr
– Key Features
• Dual-path gas analysis architecture for comprehensive monitoring
• Faraday cup and electron multiplier detector options (both standard)
• Electron multiplier provides enhanced sensitivity and faster scan speeds
• Integrated pumping system: hybrid turbomolecular pump and diaphragm pump
• Micro-hole orifice for precision pressure sampling
• RGA Windows software supporting analog scan, histogram, and pressure vs. time modes
• Factory-assembled and calibrated, ready for chamber integration
– System Components
• Residual Gas Analyzer
• By-pass valve assembly and Tee
• Controller
• Turbo pump
• Diaphragm pump
• Windows-based data acquisition and control software
– Typical Applications
In-line vacuum process monitoring and diagnostics across semiconductor fabrication, coating deposition, and research vacuum systems requiring multi-point gas species analysis at process pressure.
